The PVD thin film coatings would be best described as the physical process whereby the target material would be used as the coating has been bombarded with positively charged ionized gas molecules. The process would take place in an inert gas chamber. It would help cause the atoms to sputter into the plasma.
It would be pertinent to mention here that the vaporized atoms would be deposited when they condense as a thing film. It would deposit on the substrate that is to be coated. Hence, the name, PVD thin film coating. It has been specifically used for manufacturing of materials needing thin films in various areas.